首页> 外国专利> GAS BARRIER FILM, MANUFACTURING METHOD OF GAS BARRIER FILM, AND MANUFACTURING APPARATUS OF GAS BARRIER FILM

GAS BARRIER FILM, MANUFACTURING METHOD OF GAS BARRIER FILM, AND MANUFACTURING APPARATUS OF GAS BARRIER FILM

机译:气体阻隔膜,气体阻隔膜的制造方法以及气体阻隔膜的制造装置

摘要

PROBLEM TO BE SOLVED: To improve gas barrier property and wet heat resistance while shortening manufacturing time of a gas barrier film.;SOLUTION: In a manufacturing method of a gas barrier film of the present invention, a droplet coating process of coating solution containing polysilazane in droplets onto one surface of a resin film base material; a drying process of drying the solution coated onto the one surface by the droplet coating process to form a polysilazane layer; and a modification process of modifying the polysilazane layer into a gas barrier layer by performing ultraviolet irradiation or plasma irradiation to the polysilazane layer under the atmosphere of low oxygen concentration are performed in this order. On the droplet coating process, light energy is imparted to the solution which is transformed into droplets.;COPYRIGHT: (C)2015,JPO&INPIT
机译:解决的问题:在缩短阻气膜的制造时间的同时提高阻气性和耐湿热性。解决方案:在本发明的阻气膜的制造方法中,对含有聚硅氮烷的涂布液进行液滴涂布的方法在树脂薄膜基材的一个表面上以液滴的形式;干燥工序,其通过液滴涂布法将涂布在一个面上的溶液干燥而形成聚硅氮烷层。依次进行在低氧浓度的气氛下对聚硅氮烷层进行紫外线照射或等离子体照射而将聚硅氮烷层改性为阻气层的改性工序。在液滴涂覆过程中,将光能传递给溶液,该溶液转化为液滴。;版权所有:(C)2015,JPO&INPIT

著录项

  • 公开/公告号JP2014240051A

    专利类型

  • 公开/公告日2014-12-25

    原文格式PDF

  • 申请/专利权人 KONICA MINOLTA INC;

    申请/专利号JP20130123336

  • 发明设计人 KURAKATA SHINICHI;HIROSE TATSUYA;

    申请日2013-06-12

  • 分类号B05D7/24;B32B9/00;B05D1/02;B05D1/04;B05D3/06;B05D3/04;B05D7/04;B05C9/08;B05C9/12;B05B5/025;

  • 国家 JP

  • 入库时间 2022-08-21 15:30:28

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