Method for adjusting the temperature profile in a radial direction across the electrostatic chuck system and the substrate surface

摘要

The electrostatic chuck system for maintaining a desired temperature profile across the substrate surface is disclosed. The electrostatic chuck system comprises a pedestal support portion for defining a temperature profile substantially uniform over the surface of the pedestal support, an electrostatic chuck, which is supported by a pedestal support. The electrostatic chuck includes heating a plurality of electrodes that are independently controlled and the clamping electrode. Internal heating electrodes defining an inner heating zone, and heating electrodes are controlled independently, a peripheral portion heating electrodes defining a periphery heating zones are separated by a gap distance. Alter the thermal properties pedestal heat area, internal heating region, the periphery heating area, or, by varying the size of the gap length of the peripheral portion is heated between the electrodes and the internal heating electrodes, and adjusting the temperature profile across the substrate surface It is possible to.