Proximity exposure apparatus and proximity exposure method .

摘要

PROBLEM TO BE SOLVED: To provide a proximity exposing device and a proximity exposure method capable of averaging a gap between a mask and a workpiece by comparatively simple calculation and improving exposure accuracy.;SOLUTION: By a gap sensor 17, a gap between the mask M and the workpiece W is measured in each of four measurement points A, B, C and D. A Z-tilt adjustment mechanism 43 is driven so that, out of the coordinates of four median points K, L, M and N of respective sides of a quadrangle ABCD defined by the four measurement points A, B, C, and D, respective gaps in the coordinates of three median points K, L and M are equalized.;COPYRIGHT: (C)2011,JPO&INPIT