Inspection method and apparatus for photomask lithography by image reconstruction using the pupil filter

摘要

A method and apparatus for generating a reconstructed image that models a high NA effects of lithography equipment used to image the pattern created by the mask. Comparison of the reference image that characterize the reconstructed image and the mask. The method comprises the steps to prepare the mask reticle for inspection. Making matrix value associated with a filter matrix of light NA correction characterizing the high NA lithography system used to print the mask. The filter matrix of a high NA correction to obtain a plurality of filtered light beam comprising data of an original image to be compared with the processed reference image to obtain information characterizing the further mask is processed to obtain a reconstructed image concomitant filter lighting mask to produce a patterned illumination beam is filtered by. .FIELD 4