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Selective Repairing Process For Barrier Layer
Selective Repairing Process For Barrier Layer
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机译:屏障层的选择性修复工艺
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摘要
A selectively repairing process for a barrier layer is provided. A repair layer is formed by chemical vapor deposition using an organosilicon compound as a precursor gas. The precursor gas adsorbed on a low-k dielectric layer exposed by defects in a barrier layer is transformed to a porous silicon oxide layer has a density more than the density of the low-k dielectric layer.
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