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METHOD FOR FAST AND REPEATABLE PLASMA IGNITION AND TUNING IN PLASMA CHAMBERS
METHOD FOR FAST AND REPEATABLE PLASMA IGNITION AND TUNING IN PLASMA CHAMBERS
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机译:等离子体腔中快速可重复等离子体点火和调整的方法
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摘要
Embodiments of the present invention include methods and apparatus for plasma processing in a process chamber using an RF power supply coupled to the process chamber via a matching network. In some embodiments, the method includes providing RF power to the process chamber by the RF power supply at a first frequency while the matching network is in a hold mode, adjusting the first frequency, using the RF power supply, to a second frequency during a first time period to ignite the plasma, adjusting the second frequency, using the RF power supply, to a known third frequency during a second time period while maintaining the plasma, and changing an operational mode of the matching network to an automatic tuning mode to reduce a reflected power of the RF power provided by the RF power supply.
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