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Fabrication of enclosed nanochannels using silica nanoparticles
Fabrication of enclosed nanochannels using silica nanoparticles
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机译:使用二氧化硅纳米粒子制造封闭的纳米通道
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摘要
In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.
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