COMBINING FEATURES USING DIRECTED SELF-ASSEMBLY TO FORM PATTERNS FOR ETCHING

摘要

Provided herein is a method, including etching a first pattern into a mask, wherein the first pattern includes a first set of features corresponding to features of an imprint template; forming a second set of features over and in-between the first set of features by directed self-assembly of a block copolymer composition, wherein the first and second sets of features combine to form a second pattern; and etching the second pattern into a substrate