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Polylactide/silicon-containing block copolymers for nanolithography
Polylactide/silicon-containing block copolymers for nanolithography
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机译:用于纳米光刻的聚丙交酯/含硅嵌段共聚物
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摘要
A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block copolymer may be synthesized by a combination of anionic and ring opening polymerization reactions. This block copolymer may form nanoporous materials that can be used as etch masks in lithographic patterning.
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