IMPROVED WAYS TO GENERATE PLASMA IN CONTINUOUS POWER MANAGEMENT FOR LOW PRESSURE PLASMA PROCESSES

摘要

The present invention describes a method consisting of the following steps: introducing a substrate containing a surface to be coated on into a low pressure reaction chamber; exposing the surface to a plasma in the reaction chamber for a certain treatment time; ensuring stable ignition of the plasma by applying a power, characterized by the fact that the power input is strictly higher than zero Watt (0 W) during the treatment time and consists of at least a lower limit of the power and at least an upper limit of the power power, strictly greater than the lower limit, whereby a substrate is obtained with a coating on a surface. The present invention further describes an apparatus for treating a substrate with a low pressure plasma process and a substrate so treated.