首页> 外国专利> METHOD OF FORMING A THREE-DIMENSIONAL MICROSTRUCTURE ON A SURFACE, USES THEREOF, AND MICROSTRUCTURED PRODUCTS SO OBTAINED

METHOD OF FORMING A THREE-DIMENSIONAL MICROSTRUCTURE ON A SURFACE, USES THEREOF, AND MICROSTRUCTURED PRODUCTS SO OBTAINED

机译:在表面上形成三维微观结构的方法,所用的方法以及获得的微观结构产品

摘要

A method of forming a three-dimensional microstructure on a flat surface of a support, comprising the application of a first flat and uniform layer (2) of silicone on said surface of support (1) and the application on the first layer of silicone of a second three dimensionally microstructured layer (3) of silicone, said first layer and second layer of silicone become integrally connected to thus form a common three-dimensional microstructure ensuring anti-adhesive properties distributed regularly on the surface of the support, so that any flexible surface of substrate, in particular a surface of adhesive deposited on said layers of silicone will be microstructured by inverse replication of the three-dimensional microstructure formed by the two layers of silicone, where said layers of silicone are fixed by hardening by heating or by exposure to an ultraviolet or electronic radiation, or a combination thereof, applications thereof and films, notably self-adhesive films, such as those microstructured by said method.
机译:一种在支撑体的平坦表面上形成三维微观结构的方法,该方法包括在支撑体(1)的所述表面上施加第一平坦且均匀的有机硅层(2),并将其施加在支撑体的第一有机硅层上第二三维三维结构硅树脂层(3),所述第一三维层和第二三维硅树脂层成为整体连接,从而形成共同的三维微观结构,从而确保抗粘特性均匀地分布在支撑体表面,从而使任何柔性衬底表面,特别是沉积在所述硅酮层上的粘合剂表面将通过由两层硅酮层形成的三维微观结构的反向复制而微结构化,其中所述硅酮层通过加热或暴露而硬化而固定紫外线或电子辐射,或其组合,应用和薄膜,特别是自粘薄膜,例如通过所述方法微结构化。

著录项

  • 公开/公告号IN2012DN00383A

    专利类型

  • 公开/公告日2015-08-21

    原文格式PDF

  • 申请/专利权人 MACTAC EUROP S A;

    申请/专利号IN383/DELNP/2012

  • 发明设计人 STOCQ ROBERT GHISLAIN;

    申请日2012-01-13

  • 分类号B29C35/08;B29C59/04;B29C59/02;B29D11/00;C09J7/02;

  • 国家 IN

  • 入库时间 2022-08-21 15:15:12

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