Method for modification of top layer of titanium and its alloys by method of electrochemical plasma oxidation

摘要

modification of the superficial layer of titanium and its alloys with silicon by electrochemical oxidation in the bath containing hypophosphite plasma calcium concentration of 0.1 - 2.0 mol / dm3 and temperature 15 - 120 degrees, in which the element is anodowo gone bipolar, and subsequently subjected to tlenianiu anodowemu at anodowej current density of 5 - 200 ma / cm2 and a 100 - 650 vat the time of from 1 to 60 minutes, characterised by the fact that the modified element, pre oszlifowany or polished electrolytically, immersed in aqueous solution of salt, containing insoluble compound of silicon.