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SAMPLE MEASUREMENT RESULT PROCESSING DEVICE, SAMPLE MEASUREMENT RESULT PROCESSING METHOD, AND PROGRAM

机译:样品测定结果处理装置,样品测定结果处理方法及程序

摘要

The purpose of the present invention is to provide a device that makes it possible to ascertain the correlation between the state of contamination of a surface of a sample and the electrical characteristics of the sample. The sample measurement result processing device (100) according to the present invention is provided with a first acquisition unit (101) for dividing a surface of a sample into a plurality of measurement positions and acquiring first measurement results for each measurement position in which measurement data for the sample measured using total reflection X-ray fluorescence spectroscopy is associated with the measurement positions, a second acquisition unit (102) for dividing the surface of the sample into a plurality of measurement positions and acquiring second measurement results for each measurement position in which measurement data for the sample measured using thermally stimulated current spectroscopy is associated with the measurement positions, and an integration unit (104) for associating and integrating the acquired first measurement results and the second measurement results using the measurement positions included in the first measurement results and the second measurement results. An example of a sample is a semiconductor wafer.
机译:发明内容本发明的目的是提供一种装置,其能够确定样品表面的污染状态与样品的电特性之间的相关性。根据本发明的样本测量结果处理装置(100)设置有第一获取单元(101),用于将样本的表面划分为多个测量位置,并针对其中测量数据的每个测量位置获取第一测量结果。对于使用全反射X射线荧光光谱法测量的样品,将其与测量位置相关联,第二获取单元(102),用于将样品的表面划分为多个测量位置,并针对每个测量位置获取第二测量结果,其中使用热激励电流光谱法测量的样品的测量数据与测量位置相关联,并且积分单元(104)用于使用包括在第一测量结果中的测量位置将获取的第一测量结果和第二测量结果相关联并积分。第二次测量结果。样品的一个例子是半导体晶片。

著录项

  • 公开/公告号WO2015011947A1

    专利类型

  • 公开/公告日2015-01-29

    原文格式PDF

  • 申请/专利权人 RIGAKU CORPORATION.;

    申请/专利号JP20140057693

  • 发明设计人 KONO HIROSHI;HIRAYAMA TAISEI;

    申请日2014-03-20

  • 分类号G01N23/223;

  • 国家 WO

  • 入库时间 2022-08-21 15:08:41

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