首页>
外国专利>
SCANNED WRITING OF AN EXPOSURE PATTERN ON A SUBSTRATE
SCANNED WRITING OF AN EXPOSURE PATTERN ON A SUBSTRATE
展开▼
机译:在基材上有规律地编写曝光图案
展开▼
页面导航
摘要
著录项
相似文献
摘要
An exposure pattern is written on a substrate, by scanning a light spot along a trajectory over the substrate and switching it on and off according to a desired pattern. Respective spot sizes of the light for illuminating the substrate in respective parts of the trajectory according to a geometry of the pattern. Respective pitch values between successive ones of the parts of the trajectory are selected, in relation to the spot size selected for the respective parts. The light spot is scanned over the substrate along the trajectory, with the selected pitch values between the trajectory parts and a position dependent spot size along the trajectory. In an embodiment a helical trajectory is used.
展开▼