首页> 外国专利> HIGH SENSITIVITY PLASMONIC STRUCTURES FOR USE IN SURFACE PLASMON RESONANCE SENSORS AND METHOD OF FABRICATION THEREOF

HIGH SENSITIVITY PLASMONIC STRUCTURES FOR USE IN SURFACE PLASMON RESONANCE SENSORS AND METHOD OF FABRICATION THEREOF

机译:用于表面等离子共振传感器的高灵敏度等离子结构及其制造方法

摘要

There is disclosed a method for fabricating a plasmonic structure for use in a surface plasmon resonance sensor, comprising: coating a surface of an optically clear substrate with a monolayer of microspheres forming a sphere mask; etching the sphere mask to produce an array of microholes; depositing an adsorption layer on the etched sphere mask and the surface of the optically clear substrate; depositing a metallic film on the adsorption layer; and removing the sphere mask. This is also disclosed a plasmonic structure for use in a surface plasmon resonance sensor, comprising: an adsorption layer; and a metallic film deposited on the adsorption layer; wherein the adsorption layer and the metallic film comprises an array of microholes.
机译:公开了一种用于表面等离子体激元共振传感器中的等离子体结构的制造方法,该方法包括:用形成球罩的单层微球涂覆光学透明基板的表面;蚀刻球形掩模以产生微孔阵列;在蚀刻的球形掩模和光学透明基板的表面上沉积吸附层;在吸附层上沉积金属膜;并取下球面罩。还公开了一种用于表面等离子体共振传感器的等离子体结构,包括:吸附层;和金属膜沉积在吸附层上;其中吸附层和金属膜包括微孔阵列。

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