首页> 外国专利> BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF

BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF

机译:扰动自组装形成的嵌段共聚物纳米结构及其用途

摘要

Block copolymer nanostructures such as nanosheets, nanoribbons, and nanotubes, are provided. The nanotructures are formed by the self-assembly of block copolymers during evaporation of solvent from a sol that has been "disturbed", either i) internally by the introduction of relief (e.g. curvature) and/or the inclusion of nanoparticles in the sol; or ii) externally, e.g. by physical deformation of a semi-solid form of the sol, or a combination of internal and external disturbance. The nanostructures have uses in, for example, energy devices, electronics, sensors and drug delivery applications.
机译:提供了嵌段共聚物纳米结构,例如纳米片,纳米带和纳米管。纳米结构是通过在溶剂从已被“扰动”的溶胶中蒸发溶剂过程中嵌段共聚物的自组装形成的,或者通过以下方式进行:i)在内部通过引入凸纹(例如曲率)和/或在溶胶中包含纳米颗粒;或ii)在外部,例如通过半固态溶胶的物理变形,或内部和外部干扰的组合。纳米结构可用于例如能量装置,电子设备,传感器和药物递送应用中。

著录项

  • 公开/公告号WO2015100126A2

    专利类型

  • 公开/公告日2015-07-02

    原文格式PDF

  • 申请/专利权人 WASHINGTON STATE UNIVERSITY;

    申请/专利号WO2014US71140

  • 发明设计人 WANG YU;ZHONG WEI-HONG;

    申请日2014-12-18

  • 分类号B32B27/30;

  • 国家 WO

  • 入库时间 2022-08-21 15:05:35

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号