首页> 外国专利> METHOD FOR PRODUCING AT LEAST ONE PAD ASSEMBLY ON A SUPPORT FOR THE SELF-ASSEMBLY OF AN INTEGRATED CIRCUIT CHIP ON THE SUPPORT BY THE FORMATION OF A FLUORINATED MATERIAL SURROUNDING THE PAD AND EXPOSURE OF THE PAD AND THE FLUORINATED MATERIAL TO AN ULTRAVIOLET TREATMENT IN THE PRESENCE OF OZONE

METHOD FOR PRODUCING AT LEAST ONE PAD ASSEMBLY ON A SUPPORT FOR THE SELF-ASSEMBLY OF AN INTEGRATED CIRCUIT CHIP ON THE SUPPORT BY THE FORMATION OF A FLUORINATED MATERIAL SURROUNDING THE PAD AND EXPOSURE OF THE PAD AND THE FLUORINATED MATERIAL TO AN ULTRAVIOLET TREATMENT IN THE PRESENCE OF OZONE

机译:通过围绕在垫板上的氟化材料的形成和垫的暴露以及氟化物对小孔的暴露,在支持的集成电路芯片上的自组装芯片的支撑上至少生产一个垫组件的方法臭氧

摘要

A method for producing at least one pad assembly (32, 50) on a support (19, 43) for use in a method for self-assembling at least one element (10) on the support (19, 43), comprises fanning, on the support (19, 43), a layer (28, 48) of at least one fluorinated material around the location (30, 44) of the pad assembly (32, 50), the layer (28, 48) having a thickness greater than 10 nm. The layer (28, 48) and the location (30, 44) are exposed to an ultraviolet treatment in the presence of ozone to form the pad assembly (32, 50) at said location (30, 44), wherein a drop of liquid (16) having a static contact angle on the pad assembly (32, 50) less than or equal to 15°, after the exposure to the ultraviolet treatment, has a static contact angle on the layer (28, 48) greater than or equal to 100°.
机译:一种用于在支撑件(19、43)上生产至少一个垫组件(32、50)的方法,该方法用于在支撑件(19、43)上自组装至少一个元件(10)的方法,包括扇形展开,在支撑件(19、43)上,围绕垫组件(32、50)的位置(30、44)的至少一种氟化材料的层(28、48),该层(28、48)具有一定的厚度大于10 nm。在臭氧存在下,层(28、48)和位置(30、44)经受紫外线处理,以在所述位置(30、44)处形成垫组件(32、50),其中一滴液体(16)在暴露于紫外线处理之后,在垫组件(32、50)上的静态接触角小于或等于15°,在层(28、48)上具有的静态接触角大于或等于到100°

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