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PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT AND METHOD FOR PRODUCING PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT

机译:压电/电薄膜类型的元件和生产压电/电薄膜类型的方法

摘要

Provided is a piezoelectric/electrostrictive film type element in which the film thickness of the piezoelectric/electrostrictive film is small, the piezoelectric/electrostrictive film is dense, and the piezoelectric/electrostrictive film has good durability and insulation quality. The piezoelectric/electrostrictive film type element includes a substrate, a lower electrode film, a piezoelectric/electrostrictive film and an upper electrode film. The substrate and the lower electrode film are fixed adherently each other. The film thickness of the piezoelectric/electrostrictive film is 5 µm or less. The piezoelectric/electrostrictive film is composed of a piezoelectric/electrostrictive ceramic. The piezoelectric/electrostrictive ceramic contains lead zirconate titanate and a bismuth compound. The bismuth/lead ratio in the peripheral section inside the grain which is relatively close to the grain boundary is greater than the bismuth/lead ratio in the center section inside the grain which is relatively far from the grain boundary.
机译:提供一种压电/电致伸缩膜型元件,其中压电/电致伸缩膜的膜厚小,压电/电致伸缩膜致密,并且压电/电致伸缩膜具有良好的耐久性和绝缘质量。压电/电致伸缩膜型元件包括基板,下部电极膜,压电/电致伸缩膜和上部电极膜。基板和下部电极膜彼此粘接固定。压电/电致伸缩膜的膜厚度为5μm或更小。压电/电致伸缩膜由压电/电致伸缩陶瓷组成。压电/电致伸缩陶瓷包含锆钛酸铅和铋化合物。相对靠近晶粒边界的晶粒内部的外围部分中的铋/铅比大于相对远离晶粒边界的晶粒内部中心部分中的铋/铅比。

著录项

  • 公开/公告号EP2833425A1

    专利类型

  • 公开/公告日2015-02-04

    原文格式PDF

  • 申请/专利权人 NGK INSULATORS LTD.;

    申请/专利号EP20130769051

  • 申请日2013-03-28

  • 分类号H01L41/187;B41J2/045;B41J2/055;B41J2/16;C04B35/491;H01L41/09;H01L41/29;H01L41/314;H01L41/43;

  • 国家 EP

  • 入库时间 2022-08-21 15:03:49

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