首页> 外国专利> AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD

AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD

机译:一种用于修改多个辐射束特性的组件,光刻设备,一种用于修改多个辐射束特性的方法以及一种器件制造方法

摘要

An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method.
机译:修改多个辐射束的特性的组件,该组件包括配置为将多个辐射束更靠近地引导在一起的多个波导,以及配置为接收由多个波导引导的多个辐射束的倍频装置并产生相应的多个辐射束,其频率为更高的整数倍。还描述了相应的光刻设备,改变多个辐射束的特性的方法以及器件制造方法。

著录项

  • 公开/公告号EP2856260A1

    专利类型

  • 公开/公告日2015-04-08

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS BV;

    申请/专利号EP20130720415

  • 发明设计人 MULDER HEINE;DE JAGER PIETER;

    申请日2013-05-06

  • 分类号G03F7/20;G02B6/00;H01S5/14;

  • 国家 EP

  • 入库时间 2022-08-21 15:03:04

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