首页> 外国专利> AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD

AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD

机译:一种用于修改多个辐射束特性的组件,光刻设备,一种用于修改多个辐射束特性的方法以及一种器件制造方法

摘要

plurality of properties of the radiation beam assembly is initiated and the change of the assembly a plurality of waveguides adapted to guide becomes closer to the plurality of the radiation beam , and receiving the plurality of the radiation beam which is guided by a plurality of waveguides , and to generate a plurality of radiation beams corresponding to an integral multiple having a higher frequency and a configuration in which the frequency multiplication device . In addition , the corresponding lithographic apparatus , a method for changing the characteristics of the plurality of the radiation beam , and a device manufacturing method is described .
机译:辐射束组件的多种性质开始,并且适于引导的多个波导的组件的变化变得更加靠近多个辐射束,并接收由多个波导引导的多个辐射束,以及产生对应于具有较高频率的整数倍的多个辐射束和倍频装置的配置。另外,描述了相应的光刻设备,改变多个辐射束的特性的方法以及器件制造方法。

著录项

  • 公开/公告号KR20150028266A

    专利类型

  • 公开/公告日2015-03-13

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号KR20147037090

  • 发明设计人 MULDER HEINE;DE JAGER PIETER;

    申请日2013-05-06

  • 分类号G03F7/20;H01S5/14;H01S5/183;H01S5/42;

  • 国家 KR

  • 入库时间 2022-08-21 15:00:34

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