Chemical vapour deposition of thin films using metal amidinate precursors

摘要

The application discloses CVD of thin films employing amidinate complexes of the metals lithium, sodium, potassium, beryllium, calcium, strontium, barium, scandium, yttrium, lanthanum and the other lanthanide metals, titanium, zirconium, hafnium, vanadium, niobium, tantalum, molybdenum, tungsten, manganese, rhenium, iron, ruthenium, cobalt, rhodium, nickel, palladium, silver, Zinc, cadmium, tin, lead, antimony and bismuth as precursor. A novel cobalt precursor is also disclosed.