首页> 外国专利> Measuring device and measuring method for measuring an indicator by means of a bend analysis

Measuring device and measuring method for measuring an indicator by means of a bend analysis

机译:用于通过弯曲分析来测量指示器的测量装置和测量方法

摘要

The invention relates to a measuring device for measuring a measured variable by means of a diffraction measurement, comprising a radiation source (1) which emits radiation, an object (7-9) which is arranged in the beam path of the radiation source (1), and a radiation detector (5), which is arranged in the beam path of the radiation source (1) behind the object (7-9) and measures a diffraction pattern of the object (7-9), in particular a Fresnel diffraction image. It is proposed that the measurand to be measured is a property of an environment of the subject (7-9), the measurand influencing an environment-dependent feature quantity of the subject (7-9), so that the loop-dependent feature quantity of the subject (7-9) Measure reproduces while the environment-dependent property size of the object (7-9) affects the diffraction pattern, so that the measured diffraction image of the subject (7-9) reflects the environment-dependent property size and thus the measured variable.
机译:用于通过衍射测量来测量被测变量的测量装置技术领域本发明涉及一种用于通过衍射测量来测量被测量变量的测量装置,其包括发射辐射的辐射源(1),布置在辐射源(1)的光路中的物体(7-9)。 )和辐射检测器(5),其布置在辐射源(1)的光路中,位于物体(7-9)的后面,并测量物体(7-9)尤其是菲涅耳的衍射图衍射图像。提出要测量的被测量物是被摄体(7-9)的环境的特性,该被测量物影响被摄体(7-9)的与环境有关的特征量,从而使得与循环有关的特征量物体(7-9)的测量值会复制,同时物体(7-9)的与环境有关的属性大小会影响衍射图样,因此测得的物体(7-9)的衍射图像会反映与环境有关的属性大小,从而测量变量。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号