R1, R2, R3, R4, R5 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.M is niobium."/>
Novel dithiocarbamate niobium organic precursors and their use for vapor phase deposition of niobium containing films
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Novel dithiocarbamate niobium organic precursors and their use for vapor phase deposition of niobium containing films
Novel dithiocarbamate niobium organic precursors and their use for vapor phase deposition of niobium containing films
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机译：新型二硫代氨基甲酸酯铌有机前体及其在含铌薄膜的气相沉积中的应用
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摘要
Compounds of formula (I): M(R1CS2)R2R3R4R5R1, R2, R3, R4, R5 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.M is niobium.
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机译：式（I）的化合物：M（R 1 CS 2 ）R 2 R 3 R 4 R 5 <化学id =“ chema01”> <图像文件=“ IMGA0001.GIF” he =“ 67” id =“ ia01” imgContent =“ chem” imgFormat =“ GIF “ wi =” 51“ /> R 1 ，R 2 ，R 3 ，R 4 ，R 5 有机配体独立地选自H，直链或支链的C 1 -C 4烷基，芳基，甲硅烷基，烷基胺基，烷基甲硅烷基胺基。M是铌。
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