CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION PREPARATION SET, METHOD OF PREPARING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, AND CHEMICAL MECHANICAL POLISHING METHOD

摘要

in a planarization of the surface to be polished by chemical mechanical polishing , dishing , erosion , scratch to Fang method of producing the chemical mechanical polishing aqueous dispersion which can suppress surface defects and the like, and also in the state concentrated to provide an aqueous dispersion for producing the set for a long-term storage stability superior chemical mechanical polishing . ; An aqueous dispersion for chemical mechanical polishing for producing a set according to the invention is 15 to 40 the average comprises a colloidal silica and a basic compound having a primary particle diameter and a pH of 8 to 11 is the first of composition and the poly ( meth ) contains a carbonyl group of an organic acid having two or more of acrylic acid and that the pH is outside a second of the composition from 1 to 5 .