SELF-ORGANIZING COMPOSITION FOR FORMING PATTERN, METHOD FOR FORMING PATTERN BY SELF-ORGANIZATION OF BLOCK COPOLYMER USING SAME, AND PATTERN

摘要

In the self-organizing lithography using a block copolymer, micro-patterns formed self-organization composition that by remarkably shortening the annealing time required for phase separation can improve the throughput of pattern formation, the magnetic of the block copolymer with the composition It provides a pattern forming method and pattern by the organization. Self-organization to a composition for forming a pattern containing a block copolymer with an organic solvent containing a block having a repeating unit represented by formula (1). In the above general formula (1), X represents an alkyl group or a cycloalkyl group. n is an integer of 1 to 5, when n is greater than 2, X may be the same or different.