SUBSTRATE PROCESSING DEVICE, COVER OPENING AND CLOSING MECHANISM, SHIELDING MECHANISM, AND METHOD FOR PURGING INSIDE OF CONTAINER

摘要

it is possible to control the amount of the inert gas or dry gas, the decrease in throughput to provide a substrate processing apparatus capable of preventing. The substrate processing apparatus 10, the loader module 13, a body 31, opening 33, and cover 32. Strip the FOUP (30) from the cover (32) having the interior of the FOUP (30) through the openings 33 and the loader module 13, which communicates with the interior of the opener 42, a loader module (13) N _{in the interior of the FOUP (30) mounted in the 2} for supplying the gas N ₂ Gas supply unit 47 and, therefore, free to move to another of the two plate-like slide cover the opening surface of the opening 33 (43, 44) comprising: a slide cover (43 , 44), the interior of the shield from each other by approaching to each other when the gap to be 1 3 , the loader module (the loader module opening 33 of the FOUP (30) mounted to the 13) (13) . ;