HIGH ENERGY ION IMPLANTING DEVICE, BEAM PARALLELIZING DEVICE AND BEAM PARALLELIZING METHOD

摘要

A beam parallelizing apparatus suitable for a high energy ion implanting apparatus is provided. The beam parallelizing apparatus (300) has a plurality of lens portions (310, 312) arranged on a reference trajectory, so a parallelized beam is generated to an exit of the beam parallelizing apparatus (300) with respect to the reference trajectory. Each of the lens portions (310, 312) forms a bow-shaped curbed gap, and is configured to modify an angle formed by a beam traveling direction with respect to the reference trajectory by means of an electric field applied to the bow-shaped curved gap. Space portion (322, 324) are formed between one lens portion among the lens portions (310, 312) and a lens portion adjacent to the one lens portion. The space portions (322, 324) face toward a short-length direction on a cross-section perpendicular to a reference trajectory of a parallelized beam. An inner area including the reference trajectory is connected to an outer area of the lens portions (310, 312) via the space portions (322, 324).