首页> 外国专利> PARTICLE BEAM DETECTING APPARATUS SUBSTRATE PROCESSING SYSTEM AND PARTICLE PROCESSING SYSTEM COMPRISING THE SAME AND METHOD FOR MEASURING CHARACTERISTICS OF PARTICLE BEAM

PARTICLE BEAM DETECTING APPARATUS SUBSTRATE PROCESSING SYSTEM AND PARTICLE PROCESSING SYSTEM COMPRISING THE SAME AND METHOD FOR MEASURING CHARACTERISTICS OF PARTICLE BEAM

机译:粒子束检测装置基板处理系统和包含该粒子束特征的粒子处理系统和方法

摘要

The apparatus and method are disclosed for detecting particle beam characteristics. In one embodiment, the device includes a body including a first end and a second end, and may have at least one detector between the first end and second end. The apparatus includes a portion of the particles entering the device may have a transparent to pass through the device. In addition, the apparatus may have a minimum transparency state, the minimum transparency state, wherein substantially all of the particles entering the device can be prevented from passing through the device can be detected. By rotating the detector unit or contained therein, it is different transparency state may be achieved. By the device, the beam intensity, angle, parallelism, and it is possible to detect such beam properties and the distribution of particles in the particle beam. ;
机译:公开了用于检测粒子束特性的设备和方法。在一个实施例中,该设备包括主体,该主体包括第一端和第二端,并且可以在第一端和第二端之间具有至少一个检测器。该设备包括进入设备的一部分颗粒,该颗粒可以具有透明的以穿过设备。另外,该设备可以具有最小透明状态,即最小透明状态,其中可以检测到基本上所有进入设备的颗粒都不能通过设备。通过旋转检测器单元或将其容纳在其中,可以实现不同的透明状态。通过该装置,射束强度,角度,平行度,并且有可能检测这种射束特性以及粒子束中粒子的分布。 ;

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