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PARTICLE BEAM DETECTING APPARATUS SUBSTRATE PROCESSING SYSTEM AND PARTICLE PROCESSING SYSTEM COMPRISING THE SAME AND METHOD FOR MEASURING CHARACTERISTICS OF PARTICLE BEAM
PARTICLE BEAM DETECTING APPARATUS SUBSTRATE PROCESSING SYSTEM AND PARTICLE PROCESSING SYSTEM COMPRISING THE SAME AND METHOD FOR MEASURING CHARACTERISTICS OF PARTICLE BEAM
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机译:粒子束检测装置基板处理系统和包含该粒子束特征的粒子处理系统和方法
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摘要
The apparatus and method are disclosed for detecting particle beam characteristics. In one embodiment, the device includes a body including a first end and a second end, and may have at least one detector between the first end and second end. The apparatus includes a portion of the particles entering the device may have a transparent to pass through the device. In addition, the apparatus may have a minimum transparency state, the minimum transparency state, wherein substantially all of the particles entering the device can be prevented from passing through the device can be detected. By rotating the detector unit or contained therein, it is different transparency state may be achieved. By the device, the beam intensity, angle, parallelism, and it is possible to detect such beam properties and the distribution of particles in the particle beam. ;
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