首页> 外国专利> METHOD FOR NASAL CAVITY REPAIR IN PARTIAL OR COMPLETE ABSENCE OF INFERIOR NASAL CONCHAS IN PATIENTS SUFFERING FROM EMPTY NOSE SYNDROME

METHOD FOR NASAL CAVITY REPAIR IN PARTIAL OR COMPLETE ABSENCE OF INFERIOR NASAL CONCHAS IN PATIENTS SUFFERING FROM EMPTY NOSE SYNDROME

机译:空鼻子综合征患者部分或完全缺失下鼻甲的鼻腔修复方法

摘要

FIELD: medicine.;SUBSTANCE: two parallel incisions of the mucous membrane and the periosteum are performed. The first incision is performed at 1-1.5 cm from an attachment line of an anterior end of the inferior nasal concha to the nasal septum and extends to the nasal septum within its lower one-third. The second incision is performed at a level of the posterior end of the inferior nasal concha. Both incisions extend onto the nasal septum and are connected on the nasal septum in the U-way in parallel to the attachment line of the inferior nasal concha. The created flap is separated from the bone base of the nasal bottom and from the base of the nasal septum within its lower one-third. The created flap is used to form a fold by turning it inside; the fold simulates the inferior nasal concha and forms the inferior nasal meatus and the common nasal passage within the lower one-third of the nasal cavity.;EFFECT: method enables normalising the nasal respiration by repairing the nasal structures and increasing the tissue volume with the use of the non-rejected, non-lysed patient's material preserving the volume for a long period of time, causing the minimum risk of a secondary infection and possessing good permeability for blood vessels.;2 ex
机译:领域:药物;实质:进行两个平行的粘膜和骨膜切口。第一切口在从下鼻甲的前端的附着线到鼻中隔的1-1.5cm处进行,并在其下三分之一内延伸到鼻中隔。第二切口在下鼻甲后后端的水平处进行。两个切口均延伸至鼻中隔,并以平行于下鼻甲附着线的U形连接于鼻中隔。所产生的皮瓣在其下三分之一内与鼻底的骨根和鼻中隔的底部分开。所创建的折页用于将其向内旋转来形成折痕;褶皱模拟下鼻甲,并在鼻腔下部三分之一内形成下鼻道和鼻腔通行;效果:该方法可通过修复鼻腔结构并增加鼻腔组织容积来使鼻腔呼吸正常化。使用不排斥,不溶解的患者的材料可长时间保存体积,将继发感染的风险降至最低,并具有良好的血管通透性。2ex

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