Device for electron beam evaporation in continuously operating vacuum-coating machines

摘要

Device for electron beam vapor deposition, in which in continuously operating vacuum-coating machines a substrate to be coated in a longitudinal direction by means of a crucible for receiving the material as a target, from which on the side facing the crucible, a layer of the substrate is to be applied, can be guided, wherein the crucible transversely to the longitudinal direction and is movable back and forth between the crucible and the side of the substrate to be coated, a diaphragm device is arranged, characterized in that the diaphragm arrangement an adjustable shape-changing arrangement of screening diaphragms between the substrate and the crucible, which is designed in such a way that the size of the exposed to the steam coating zone (11) in synchronism with a change in the vapour cloud (7) is variable.