METHOD FOR THE POLYMERIZATION OF A COMPOSITION CONTAINING HYDRIDOSILANES AND FOR THE SUBSEQUENT USE OF THE POLYMERS TO PRODUCE LAYERS CONTAINING SILICON

摘要

A method for polymerizing a composition including hydridosilanes and subsequently using the polymers to produce silicon containing layers, comprising the following steps: a) providing a substrate; b) providing a composition including at least one hydridosilane that is dissolved in at least one organic and/or inorganic solvent, or including at least one hydridosilane that is already present in liquid form without solvent, wherein the hydridosilanes comprise at least one linear and/or one branched hydridosilane of the general formula SinH2n+2, where n≥3, and/or a cyclic hydridosilane of the general formula SinH2n, where n≥3; c) polymerizing the composition from step b) by way of acoustic cavitation; and d) coating the surface of the substrate with reaction products from step c). A device for polymerizing a composition including hydridosilanes and subsequently using the polymers to produce silicon containing layers, comprising at least one reaction vessel (1) containing a composition that includes at least one hydridosilane that is dissolved in at least one organic and/or inorganic solvent, or at least one hydridosilane that is already present in liquid form without solvent, wherein the hydridosilanes comprise at least one linear and/or branched hydridosilane of the general formula SinH2n+2, where n≥3, and/or a cyclic hydridosilane of the general formula SinH2n, where n≥3, and/or containing the abovementioned hydridosilane solution or the pure liquid hydridosilane, to which at least monosilane and/or disilane and/or boron containing dopant and/or phosphorus containing dopant and/or a noble gas from the group Ar, He and/or nanoparticles and/or a polymerization initiator and/or a catalyst and/or surface tension modifying agents can be added, and an ultrasound source and/or a sound transducer (4) for generating acoustic cavitation and/or capillary waves, wherein the reaction vessel (1) has at least one closable opening (6), the substrate (8) to be coated is disposed opposite the opening (6), and the substrate (8) comprises a heating source (9) on the surface that faces away from the coating surface.