首页> 外国专利> COPPER COLLOID CATALYST LIQUID FOR ELECTROLESS COPPER PLATING AND ELECTROLESS COPPER PLATING METHOD

COPPER COLLOID CATALYST LIQUID FOR ELECTROLESS COPPER PLATING AND ELECTROLESS COPPER PLATING METHOD

机译:化学镀铜的铜胶体催化剂液体及化学镀铜的方法

摘要

PROBLEM TO BE SOLVED: To improve the temporal stability of a copper catalyst liquid and obtain a copper coating excellent in appearance by subjecting a non-conductive substrate having a catalyst to electroless copper plating.SOLUTION: After immersing a non-conductive substrate in a surfactant containing liquid to perform preliminary adsorption promotion treatment, the temporal stability of the catalyst liquid is remarkably improved by applying a catalyst on the non-conductive substrate using a copper colloid catalyst liquid for electroless copper plating including (A) a soluble copper salt, (B) a reducing agent, (C) a colloid stabilizer and (D) a specified saccharide, such as glucose, malt sugar, xylitol and sorbitol to perform electroless copper plating. Since the catalyst is applied after enhancing catalytic activity to perform electroless plating, the precipitated copper coating is excellent in appearance.SELECTED DRAWING: None
机译:解决的问题:通过对具有催化剂的非导电性基材进行化学镀铜,以提高铜催化剂液体的时间稳定性并获得外观优异的铜涂层。通过使用包含用于(A)可溶性铜盐的化学镀铜的铜胶体催化剂液体在非导电性基材上施加催化剂,可显着提高催化剂液体的时间稳定性,以进行初步的吸附促进处理。 )还原剂,(C)胶体稳定剂和(D)特定的糖类,例如葡萄糖,麦芽糖,木糖醇和山梨糖醇,以进行化学镀铜。由于在提高催化活性后进行了化学镀处理,因此析出的铜涂层具有优异的外观。

著录项

  • 公开/公告号JP2016151056A

    专利类型

  • 公开/公告日2016-08-22

    原文格式PDF

  • 申请/专利权人 ISHIHARA CHEMICAL CO LTD;

    申请/专利号JP20150030395

  • 发明设计人 UCHIDA MAMORU;TANAKA KAORU;TANAKA YUYA;

    申请日2015-02-19

  • 分类号C23C18/30;C23C18/28;C23C18/40;B01J35/12;B01J37/02;B01J23/72;

  • 国家 JP

  • 入库时间 2022-08-21 14:47:31

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号