IMPRINT DEVICE, REFERENCE MARK SUBSTRATE, ALIGNMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide an imprint device capable of preventing a transfer pattern of a transfer substrate from being broken or stained by a foreign matter on a reference mark substrate, when aligning the transfer substrate with the reference mark substrate.SOLUTION: An imprint device includes a substrate stage for holding a transferred substrate; a reference mark substrate fixed onto the substrate stage, and having a reference mark; a chuck arranged above the substrate stage, and holding a transfer substrate having a transfer pattern; and an alignment camera capable of observing the reference mark of the reference mark substrate via the transfer substrate held by the chuck. A recess or a hole is formed in a region of the reference mark substrate facing the transfer pattern of the transfer substrate, when the reference mark of the reference mark substrate is observed by the alignment camera.SELECTED DRAWING: Figure 1