SURFACE STATE INSPECTION METHOD FOR FLAT SUBSTRATE, AND SURFACE STATE INSPECTION DEVICE FOR FLAT SUBSTRATE USING SURFACE STATE INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a surface state inspection method for a flat substrate, capable of identifying a type of a defect generated on the flat substrate on which an electronic device or the like is formed, and a surface state inspection device that uses the method.SOLUTION: The surface state inspection device for a flat substrate, which inspects whether the type of the defect on a surface of the flat substrate on which the electronic device or the like is formed is a recessed defect or a projected defect, comprises: a projection system that irradiates an irradiation point with a detection light at a predetermined incident angle relative to a substrate normal of the flat substrate; a light-receiving system that is provided in a space on an opposite side to the projection system to receive scattering light; a plurality of scattering light detectors that detect the scattering light; light receiving range restriction means that restricts a light receiving range to prevent the same scattering light from entering the scattering light detectors; and waveform comparison determination means that compares waveforms of scattering light intensity detected by the scattering light detectors to determine whether the type of defect of the flat substrate is the recessed defect or the projected defect.