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SUCK-BACK VALVE, SUCK-BACK VALVE SYSTEM AND SUBSTRATE PROCESSING APPARATUS

机译:回油阀,回油阀系统和基质处理设备

摘要

PROBLEM TO BE SOLVED: To prevent deterioration of process liquid and to easily and exactly execute a desired suck-back motion by a simple operation.;SOLUTION: In a suck-back valve 200, first, second, third, fourth and fifth positions p1, p2, p3, p4, p5 are set on an axis CA in this order from an internal space SP1. A moving member 240 moves between the fourth and the fifth positions p4, p5 by supply or non-supply of the air to one flow channel PT1. When the moving member 240 is at the fourth position p4, a moving member 220 moves between the first and the second positions p1, p2 by supply or non-supply of the air to the other flow channel PT2. When the moving member 240 is at the fifth position p5, the moving member 220 moves between the first and the third positions p1, p3 by supply or non-supply of the air to the other flow channel PT2. A diaphragm 224 is attached to the moving member 220. Resist liquid flows in a circulation space SPc at a lower part of the diaphragm 224.;SELECTED DRAWING: Figure 6;COPYRIGHT: (C)2016,JPO&INPIT
机译:解决的问题:为了防止处理液变质,并通过简单的操作轻松准确地执行所需的回抽运动。解决方案:在回抽阀200中,第一,第二,第三,第四和第五位置p1从内部空间SP1开始,在轴CA上依次设置p1,p2,p3,p4,p5。移动部件240通过向一个流路PT1供给或不供给空气而在第四位置p4与第五位置p5之间移动。当移动构件240处于第四位置p4时,通过向另一流动通道PT2供应或不供应空气,移动构件220在第一位置p1,第二位置p2之间移动。当移动构件240处于第五位置p5时,通过向另一流动通道PT2供应或不供应空气,移动构件220在第一位置p1,第三位置p3之间移动。隔膜224附接到移动构件220。抗蚀剂液体在隔膜224的下部的循环空间SPc中流动。;选择图:图6;版权:(C)2016,JPO&INPIT

著录项

  • 公开/公告号JP2016111306A

    专利类型

  • 公开/公告日2016-06-20

    原文格式PDF

  • 申请/专利权人 SCREEN HOLDINGS CO LTD;

    申请/专利号JP20140250261

  • 发明设计人 KASHIWAYAMA MASATO;

    申请日2014-12-10

  • 分类号H01L21/027;F16K23/00;B05C11/10;B05C11/08;B05C5/00;

  • 国家 JP

  • 入库时间 2022-08-21 14:46:05

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