SINTERED BODY FOR ZnO-MgO-BASED SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a ZnO-MgO-based sputtering target capable of stably forming a film at high speed, a sintered body for manufacturing a target and a manufacturing method of the sintered body.SOLUTION: There is provided a ZnO-MgO-based sintered body containing Mg of 3 to 50 mol% in terms of MgO and the balance ZnO with inevitable impurities and satisfying 0.01≤I1/I2≤1.00, where I1 is peak strength of the MgO phase in the ZnO-MgO sintered body and I2 is peak strength of the MgO phase in a mixed powder of a ZnO powder and a MgO powder (having random directions respectively) with a ratio equal to a ratio of Mg and Zn in the sintered body in an X ray diffraction peak.SELECTED DRAWING: None