首页> 外国专利> METHOD FOR MANUFACTURING INTERFERENCE FILTER, INTERFERENCE FILTER, OPTICAL FILTER DEVICE, OPTICAL MODULE, AND ELECTRONIC EQUIPMENT

METHOD FOR MANUFACTURING INTERFERENCE FILTER, INTERFERENCE FILTER, OPTICAL FILTER DEVICE, OPTICAL MODULE, AND ELECTRONIC EQUIPMENT

机译:制造干涉滤光片的方法,干涉滤光片,光学滤光片装置,光学模块和电子设备

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an interference filter by which generation of hillocks or whiskers can be suppressed, an interference filter, an optical filter device, an optical module, and electronic equipment.;SOLUTION: A method for manufacturing a wavelength variable interference filter is provided, where the filter includes a fixed substrate, a fixed reflection film 54 provided on the fixed substrate, and a movable reflection film opposing to the fixed reflection film 54. The method includes carrying out the following steps: a reflection film formation step of forming the fixed reflection film 54 on the fixed substrate (first glass substrate M1) by using a metal material; and a deformation step (heating step) of deforming the fixed substrate (first glass substrate M1) by bending in a direction to allow a surface where the fixed reflection film 54 is formed to protrude.;COPYRIGHT: (C)2016,JPO&INPIT
机译:要解决的问题:提供一种用于制造干涉滤光片的方法,通过该方法可以抑制小丘或胡须的产生;一种干涉滤光片,光学滤光片装置,光学模块和电子设备。提供一种波长可变干涉滤光片,该滤光片包括固定基板,设置在固定基板上的固定反射膜54和与固定反射膜54相对的可移动反射膜。该方法包括以下步骤:膜形成步骤,通过使用金属材料在固定基板(第一玻璃基板M1)上形成固定反射膜54; (C)2016,JPO&INPIT;以及通过沿使形成固定反射膜54的表面突出的方向弯曲来使固定基板(第一玻璃基板M1)变形的变形步骤(加热步骤)。

著录项

  • 公开/公告号JP2016011986A

    专利类型

  • 公开/公告日2016-01-21

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20140132268

  • 申请日2014-06-27

  • 分类号G02B26/00;B81B3/00;G02B5/28;G01J3/26;G01J3/51;

  • 国家 JP

  • 入库时间 2022-08-21 14:45:48

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