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Polymer precursors for producing graphene nanoribbons and suitable oligophenylene monomers for their preparation

机译:用于生产石墨烯纳米带的聚合物前体和用于制备它们的合适的低聚亚苯基单体

摘要

The present invention is a compound of the general formula I: wherein R1 is H, halogen, —OH, —NH 2, —CN, —NO 2, or halogen (F, Cl, Br, I), —OH, — A linear or branched saturated or unsaturated C1-C40 hydrocarbon residue, which may be substituted with NH2, -CN and / or -NO2, wherein one or more CH2 groups are —O—, —S—, —C (O) O—, —O—C (O) —, —C (O) —, —NH— or —NR 3 — can be replaced, where R 3 is , An optionally substituted C1-C40 hydrocarbon residue, or an optionally substituted aryl, alkylaryl, alkoxyaryl, alkanoyl or aroyl residue; R2a and R2b are H, or optionally 1 Pair or pairs of adjacent R2 / R2b combines to form a single bond in a six-membered carbocycle; m is an integer from 0 to 3; n is 0 or 1; X is a halogen or trifluoromethylsulfonate; And Y is H; or X is H and Y is halogen or trifluoromethylsulfonate). The invention further relates to a polymer precursor and a method for preparing graphene nanoribbons from oligophenylene monomer and polymer precursor.
机译:本发明是通式I的化合物:其中R 1为H,卤素,-OH,-NH 2,-CN,-NO 2或卤素(F,Cl,Br,I),-OH,-A可以被NH 2,-CN和/或-NO 2取代的直链或支链的饱和或不饱和C 1 -C 40烃残基,其中一个或多个CH 2基团为-O-,-S-,-C(O)O-,可以替换-OC(O)-,-C(O)-,-NH-或-NR 3-,其中R 3是,任选取代的C 1 -C 40烃残基,或任选取代的芳基,烷基芳基,烷氧基芳基,烷酰基或芳酰基残基; R 2a和R 2b为H,或任选地一对或一对相邻的R 2 / R 2b结合以在六元碳环中形成单键; m是0至3的整数; n为0或1; X是卤素或三氟甲基磺酸盐; Y是H;或X为H,Y为卤素或三氟甲基磺酸盐。本发明还涉及聚合物前体和由低聚亚苯基单体和聚合物前体制备石墨烯纳米带的方法。

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