首页> 外国专利> POLYMERIC PRECURSORS FOR PRODUCING GRAPHENE NANORIBBONS AND SUITABLE OLIGOPHENYLENE MONOMERS FOR PREPARING THEM

POLYMERIC PRECURSORS FOR PRODUCING GRAPHENE NANORIBBONS AND SUITABLE OLIGOPHENYLENE MONOMERS FOR PREPARING THEM

机译:制备石墨烯纳米聚合物的聚合物前体和制备它们的合适的低聚苯醚单体

摘要

122140222331402a2b2a2bThe invention relates to oligophenylene monomers of general formula I wherein R is H halogene OH NH CN NO or a linear or branched saturated or un saturated C C hydrocarbon residue which can be substituted 1 to 5 fold with halogene (F Cl Br I) OH NH CN and/or NO and wherein one or more CH groups can be replaced by O S C(O)O O C(O) C(O) NH or NR wherein R is an optionally substituted C C hydrocarbon residue or an optionally substituted aryl alkylaryl alkoxyaryl alkanoyl or aroyl residue; R and R are H or optionally one or more of the pairs of adjacent R /R is joined to form a single bond in a six membered carbocycle; m is an integer of from 0 to 3; n is 0 or 1; and X is halogene or trifluoromethylsulfonate and Y is H; or X is H and Y is halogene or trifluoromethylsulfonate. The invention further relates to polymeric precursors as well as methods for preparing graphene nanoribbons from the oligophenylene monomers and the polymeric precur sors.
机译:122140222331402a2b2a2b本发明涉及通式I的低聚亚苯基单体,其中R为H卤素OH NH CN NO或可被卤素(F Cl Br I)取代1-5倍的直链或支链饱和或不饱和CC烃基OH NH CN和/或NO,并且其中一个或多个CH基可以被OSC(O)OOC(O)C(O)NH或NR取代,其中R为任选取代的CC烃基或任选取代的芳基烷基芳基烷氧基芳基烷酰基或芳酰基; R和R为H,或任选地一对相邻的R / R中的一个或多个在六元碳环中连接形成单键; m是0至3的整数; n为0或1; X是卤素或三氟甲基磺酸盐,Y是H;或X是H,Y是卤素或三氟甲基磺酸盐。本发明还涉及聚合物前体以及由低聚亚苯基单体和聚合物前体制备石墨烯纳米带的方法。

著录项

  • 公开/公告号IN2015CN02689A

    专利类型

  • 公开/公告日2016-07-01

    原文格式PDF

  • 申请/专利权人

    申请/专利号IN2689/CHENP/2015

  • 申请日2015-05-11

  • 分类号C07C15/14;C01B31/04;C07C15/20;C07C15/30;C07C25/18;C07C15/12;C07C245/20;C07C309/66;C08G61/10;

  • 国家 IN

  • 入库时间 2022-08-21 14:25:11

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