首页> 外国专利> ANTI-REFLECTION FILM FOR INSERT MOLDING AND RESIN MOLDED PRODUCT PRODUCED USING THE SAME

ANTI-REFLECTION FILM FOR INSERT MOLDING AND RESIN MOLDED PRODUCT PRODUCED USING THE SAME

机译:防反光膜,用于使用该防反光膜生产的插入式模塑和树脂模塑产品

摘要

PROBLEM TO BE SOLVED: To provide an anti-reflection film which offers a superior anti-reflection performance, an anti-fingerprint property and wipability and which has a hard coat layer and yet is suitable for insert molding.SOLUTION: An anti-reflection film comprises a thermoplastic transparent base material film having a hard coat layer, intermediate refractive index layer, high refractive index layer, and low refractive index layer formed thereon in the described order. The low refractive index layer is obtained by curing a low refractive index layer-forming composition comprising; (a) 5.0-15.0 mass% of a (meth)acrylate containing a perfluoroalkyl chain of C2-C7, (b) 2.0-8.0 mass% of a polyether-modified polydimethylsiloxane having an acrylic group or polyester-modified polydimethylsiloxane having an acrylic group, (c) 9.0-70.0 mass% of a fluorine compound having polymerizable double bonds that can be copolymerized with the components (a) and (b), (d) 22.0-83.0 mass% of hollow silica microparticles, and (e) 1.0-10.0 mass% of a photopolymerization initiator.SELECTED DRAWING: None
机译:解决的问题:提供一种抗反射膜,该膜具有优异的抗反射性能,抗指纹性能和可刮擦性,并具有硬涂层,但仍适用于嵌件成型。解决方案:包括透明热塑性基材薄膜,其具有以所述顺序形成在其上的硬涂层,中折射率层,高折射率层和低折射率层。低折射率层是通过使形成低折射率层的组合物固化而得到的。 (a)5.0-15.0质量%的含有C 2 -C 7的全氟烷基链的(甲基)丙烯酸酯,(b)2.0-8.0质量%的具有丙烯酸基的聚醚改性的聚二甲基硅氧烷或具有丙烯酸基的聚酯改性的聚二甲基硅氧烷(c)9.0〜70.0质量%的具有可与成分(a)和(b)共聚的可聚合双键的氟化合物,(d)22.0〜83.0质量%的中空二氧化硅微粒,和(e)1.0 -10.0质量%的光聚合引发剂。

著录项

  • 公开/公告号JP2016071307A

    专利类型

  • 公开/公告日2016-05-09

    原文格式PDF

  • 申请/专利权人 NOF CORP;

    申请/专利号JP20140203659

  • 发明设计人 MURASE MASAYUKI;NOJIMA TAKAYUKI;

    申请日2014-10-02

  • 分类号G02B1/11;G02B1/10;B32B27/30;B32B27/00;

  • 国家 JP

  • 入库时间 2022-08-21 14:42:38

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