首页>
外国专利>
Carbon nanowall array and method for producing carbon nanowall
Carbon nanowall array and method for producing carbon nanowall
展开▼
机译:碳纳米壁阵列和生产碳纳米壁的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A carbon nanowall array (10) is provided with a substrate (1) and carbon nanowalls (2-9). The substrate (1) is composed of silicon, and includes protruding portions (11) and recessed portions (12). The protruding portions (11) and recessed portions (12) are formed in the direction (DR1) on one surface of the substrate (1). The protruding portions (11) and recessed portions (12) are alternately formed in the direction (DR2) perpendicular to the direction (DR1). Each of the protruding portions (11) has a length of 0.1-0.5 m in the direction (DR2), and each of the recessed portions (12) has a length of 0.6-1.5 m in the direction (DR2). The height of each of the protruding portions (11) is 0.3-0.6 m. Respective carbon nanowalls (2-9) are formed in the length direction (i.e., the direction (DR1)) of the protruding portions (11) of the substrate (1), said carbon nanowalls being formed on the protruding portions (11).
展开▼