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The liquid immersion member, an immersion exposure apparatus, device manufacturing method, and an immersion exposure method

机译:液浸构件,液浸曝光装置,装置的制造方法以及液浸曝光方法

摘要

In the immersion exposure apparatus, an optical element, and the liquid immersion member is disposed at least partly around the optical path of the exposure light passing through the first liquid between an object and the optical member. Is disposed at least partly around the optical path, the liquid immersion member, the first of the first liquid on the exit side of the optical member the optical path of the exposure light between the object and the optical member to be filled with the first liquid a first liquid immersion member which forms a liquid immersion space, and a guide portion for guiding the first guiding space is a portion of the periphery of the optical path, at least a portion of the first liquid of the first liquid immersion space, with respect to the optical path It is located outside the first liquid immersion member Te, the part of the periphery of the first liquid immersion space, and the second liquid immersion member adjacent to the first guiding space to form the second liquid immersion space of the second liquid and, I include a.
机译:在浸没曝光设备中,光学元件和浸液构件至少部分地围绕穿过物体和光学构件之间的第一液体的曝光光的光路设置。至少部分地围绕光路,液浸构件,第一液体中的第一种在光学构件的出射侧上布置在物体和要被第一液体填充的光学构件之间的曝光光的光路。形成液浸空间的第一液浸构件和用于引导第一引导空间的引导部是光路的周边的一部分,即第一液浸空间的第一液体的至少一部分。位于第一液浸构件Te的外部,第一液浸空间的周边的一部分,以及第二液浸构件的与第一引导空间相邻的位置,形成第二液的第二液浸空间。并且,我包括一个。

著录项

  • 公开/公告号JP5999093B2

    专利类型

  • 公开/公告日2016-09-28

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20130529236

  • 发明设计人 佐藤 真路;

    申请日2011-12-27

  • 分类号G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 14:41:45

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