首页> 外国专利> Glass regeneration processing method, recycled glass substrate, and photomask blanks and photomasks using the same

Glass regeneration processing method, recycled glass substrate, and photomask blanks and photomasks using the same

机译:玻璃再生处理方法,回收的玻璃基板以及使用其的光掩模坯料和光掩模

摘要

The present invention relates to a method of regenerating and recycling a photomask used in the production of various flat panels and a photomask that has become defective in the photomask manufacturing process for reuse as a new glass substrate for photomask. The present invention relates to a glass substrate for a photomask regenerated by a processing method, a photomask blank and a photomask using the glass substrate. Recycled glass substrate with low defects and low defects by the process of homogenizing wettability so that the original pattern trace does not appear in the breath image inspection without performing the conventional physical polishing process on the surface of the recycled glass substrate Makes it possible to obtain
机译:本发明涉及一种再生和再循环用于生产各种平板的光掩模的方法,以及一种在光掩模的制造工艺中已经变得有缺陷的光掩模,以用作新的光掩模玻璃基板。本发明涉及通过加工方法再生的光掩模用玻璃基板,光掩模坯料以及使用该玻璃基板的光掩模。通过使润湿性均质化,可以使缺陷少,缺陷少的再生玻璃基板在不对再生玻璃基板的表面进行常规的物理研磨处理的情况下,在呼吸图像检查中不会出现原始图案痕迹。

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