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High voltage SCRMOS in BiCMOS process technology

机译:BiCMOS工艺技术中的高压SCRMOS

摘要

Around the terminal and SCR (1010) and the drain region (1012), integrated circuit, including SCRMOS transistor formed surface field is reduced (RESURF) region with (1024). Is the same conductivity type as that of the (1014) drift region, RESURF region is more heavily doped than the (1014) drift region.
机译:在端子和SCR(1010)和漏极区域(1012)周围,包括SCRMOS晶体管形成的表面场的集成电路(RESURF)区域减小为(1024)。与(1014)漂移区的导电类型相同,RESURF区域比(1014)漂移区的掺杂程度更高。

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