首页>
外国专利>
CHARGE DECAY MEASUREMENT SYSTEMS AND METHODS
CHARGE DECAY MEASUREMENT SYSTEMS AND METHODS
展开▼
机译:电荷衰减测量系统和方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Various approaches to can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation. Decay constants can be measured to provide information regarding the sample. Additionally, electric and/or magnetic field biases can be applied to the sample to provide additional information.
展开▼