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TFT-LCD array substrate manufacturing method and LCD panel/device produced by the same
TFT-LCD array substrate manufacturing method and LCD panel/device produced by the same
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机译:TFT-LCD阵列基板的制造方法及其生产的液晶面板/装置
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摘要
The present invention teaches a TFT-LCD array substrate manufacturing method: a) forming a gate electrode, a gate electrode insulator layer, an active layer, a source electrode and a drain electrode, a passivation layer, and a passivation layer via on top of the drain electrode on a glass substrate; b) depositing an ITO film on the glass substrate processed by the step a), removing through exposure and development the photo resist in a TFT area outside the passivation layer via and a part of the photo resist in a pixel area where gaps are to be formed, and revealing the ITO film outside the passivation layer via in the TFT area; c) removing a remaining photo resist in the pixel area where gaps are to be formed using a fourth dry etch, so that the ITO film on the gaps to be formed is revealed; d) removing the revealed ITO film using a third wet etch; and e) peeling the photo resist not yet removed, and forming an ITO electrode that is connected to the passivation layer via. The present invention also teaches a LCD panel and a LCD device having a TFT-LCD array substrate manufactured by foregoing method.
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