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Molecular organometallic resists for EUV
Molecular organometallic resists for EUV
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机译:用于EUV的分子有机金属抗蚀剂
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摘要
Described herein are organometallic or inorganic complexes with high extreme ultraviolet (EUV) optical density (OD) and high mass density for use in thin films. These thin films are used as high resolution, low line edge roughness (LER) EUV photoresists. The complexes may also be included in nanoparticle form for use in photoresists.
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