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Spot-array imaging system for maskless lithography and parallel confocal microscopy

机译:用于无掩模光刻和平行共聚焦显微镜的点阵成像系统

摘要

In a scanned-spot-array lithography system, a modulated array of radiant-energy source spots is imaged by a projection lens onto a printing surface, which is scanned in synchronization with the spot modulation to print a synthesized, high-resolution raster image. Similarly, in a scanned-spot-array microscopy system, an array of radiant-energy source spots is imaged by a projection lens onto an inspection surface, and radiation reflected from or transmitted through the image spots is collected and detected to acquire a synthesized, high-resolution raster image of the surface. In either case, the spot-generation optics can be configured to counterbalance and neutralize imperfect imaging characteristics of the projection lens, enabling perfectly flat-field, distortion-free, and aberration-free point imaging of the entire spot array. The spot-generation optics can also be further configured to achieve narrow-band achromatization of the optical system, and to optimally control the intensity and polarization characteristics of the image-plane radiation.
机译:在扫描点阵列光刻系统中,辐射能源点的调制阵列通过投影透镜成像到打印表面上,该打印表面与点调制同步进行扫描以打印合成的高分辨率光栅图像。类似地,在扫描点阵列显微镜系统中,辐射能源点阵列通过投影透镜成像在检查表面上,并且收集并检测从图像点反射或透射过图像点的辐射,以获取合成的,表面的高分辨率光栅图像。无论哪种情况,都可以将光斑产生光学器件配置为平衡并抵消投影透镜的不完美成像特性,从而实现整个光斑阵列的完美平场,无畸变和无像差点成像。点生成光学器件还可以进一步配置为实现光学系统的窄带消色差,并以最佳方式控制像面辐射的强度和偏振特性。

著录项

  • 公开/公告号US9188874B1

    专利类型

  • 公开/公告日2015-11-17

    原文格式PDF

  • 申请/专利权人 KENNETH C. JOHNSON;

    申请/专利号US201213523843

  • 发明设计人 KENNETH C. JOHNSON;

    申请日2012-06-14

  • 分类号G03F7/20;G01B9/04;G01N21/88;G02B21/00;

  • 国家 US

  • 入库时间 2022-08-21 14:30:37

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