首页> 外国专利> Binary or higher order high-density thermodynamically stable nanostructured copper-based tantalum metallic systems, and methods of making the same

Binary or higher order high-density thermodynamically stable nanostructured copper-based tantalum metallic systems, and methods of making the same

机译:二元或更高阶高密度热力学稳定的纳米结构的铜基钽金属体系及其制备方法

摘要

A binary or higher order high-density thermodynamically stable nanostructured copper-tantalum based metallic system according to embodiments of the invention may be formed of: a solvent of copper (Cu) metal that comprises 70 to 100 atomic percent (at. %) of the metallic system; and a solute of tantalum (Ta) metal dispersed in the solvent metal, that comprises 0.01 to 15 at. % of the metallic system. The metallic system is thermally stable, with the absence of substantial gross grain growth, such that the internal grain size of the solvent metal is substantially suppressed to no more than about 250 nm at approximately 98% of the melting point temperature of the solvent metal and the solute metal remains substantially uniformly dispersed in the solvent metal at that temperature. Processes for forming these metallic systems may include: subjecting powder metals of solvent and the solute to a high-energy milling process using a high-energy milling device to impart high impact energies to its contents. Due to their high-density thermodynamically stable nanostructured, these metallic systems are an ideal candidate for fabricating shaped charge liners for ordinance.
机译:根据本发明的实施方案的二元或更高阶的高密度热力学稳定的纳米结构的铜-钽基金属系统可以由以下物质形成:铜(Cu)金属的溶剂,其包含70-100原子%(原子%)的铜。金属系统以及分散在溶剂金属中的钽(Ta)金属的溶质,其含量为0.01atat至15at。%。金属体系的百分比。金属系统是热稳定的,没有明显的总晶粒长大,从而在大约98%的溶剂金属熔点温度和90%的熔点温度下,基本上将溶剂金属的内部晶粒大小抑制到不超过250 nm。在该温度下,溶质金属基本上保持均匀地分散在溶剂金属中。形成这些金属体系的方法可以包括:使用高能研磨装置对溶剂和溶质的粉末金属进行高能研磨过程,以对其内含物施加高冲击能。由于其高密度热力学稳定的纳米结构,这些金属系统是制造用于法令的成形装药衬里的理想选择。

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