AN AUTOMATIC GAS DELIVERY SYSTEM FOR DRY/WET THERMAL OXIDATION OF SILICON WAFERS

摘要

The present invention relates to an automated system configured to deliver gas in a controlled manner especially designed for thermal oxidation process, such as dry, wet, dry wet dry, therein comprising plurality of valves to allow sequential flow of gases, means to control subsequent opening and closing operation of said valves, means to regulate the said sequence of operation in a predetermined time interval. It also comprises plurality of safety interlocks to make the system reliable and to fix the breakdown such as carrier gas failure, compressed air failure, over temperature of deionized water in quartz bubbler etc. It may also be operated in three modes- Manual, semi automatic and automatic, based on the user input selection.